CHY-T12100A-3Z4C 1200 degree CVD system for Garaphene Film Preparation

1.O.D100*1000mm high purity quartz tube

2.High quality ceramic fiber chamber

3.The CVD method is PID programmable controller

4.Three gas way mass flow controller with a precision gas flow controller

5.Two stage Vacuum Pump

5.Made by Henan Chengyi

Our CVD machine has three gas way mass flow controller with a precision gas flow controller. Our products are very popular, please contact us as soon as possible!

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Application

1.Laboratory heat thermal processing

2.High Vacuum Sintering Heating Annealing Brazing

3.Laboratory Thin Film Preparation,Nano tube growthing

4.Laboratory CVD system,graphene growthing,preparation.

Laboratory 1200 degree CVD Furnace with O.D60*1000mm Quartz Tube

1200c vacuum CVD tube furnace compact CVD tube furnace horizontal CVD tube furnace vacuum CVD tube furnace parts hnchengyi cvd tube furnace manufacturers hnchengyi cvd system.

Product parameters

Product Name	1200 degree CVD Furnace
Modle No.	CHY-T12100A-3Z4C
Heating zones	Single heating zone
Heating zone length	400mm
Constant temperature zone length	200mm
Tube Material	high purity quartz tube
Tube diameter	O.D100I.D941000mm Quartz Tube
Tube Length	1000mm,750mm,1000mm,1200mm as enquiry
Thermcouple	K type
Maximum heating temper	1150 dgree
Heating rate	20c/min,adjustable suggestion 10 degree/min
Heating element	Fe-Co-Al by Mo alloy
Sealing Method	stainless steel vacuum flange
Vacuum Air-tightness	9.8×10-4Pa
Temperature Accuracy	±1℃
Control Mode	Intelligent PID programmable Control,30 steps sintering curve restore
Mass Flow Controller	3 gas way mass flow controller
Flowmeter Core	304 stainless steel
Measure Accuracy	+/- 1.0% F.S
Pressure Range	-0.1~0.15MPa
A way gas range	0~100SCCM
B way gas range	0~200SCCM
C way gas range	0~500SCCM,or as customized
Vacuum Pump	4C
Power Supply	AC220V 50Hz