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  • CHY-T1280A-3Z4C Laboratory CVD Tube Furnace with O.D80*1000mm Quartz Tube
  • CHY-T1280A-3Z4C Laboratory CVD Tube Furnace with O.D80*1000mm Quartz Tube
  • CHY-T1280A-3Z4C Laboratory CVD Tube Furnace with O.D80*1000mm Quartz Tube

CHY-T1280A-3Z4C Laboratory CVD Tube Furnace with O.D80*1000mm Quartz Tube

1.O.D80*1000mm high purity quartz tube

2.Laboratory CVD tube furnace with high-quality ceramic fiber chamber

3.PID Programmable controller

4.CVD chemical vapor deposition equipment has three gas way mass flow controller with a precision gas flow controller

5.Two stage Vacuum Pump

5.Made by Henan Chengyi

Laboratory 1200 degree CVD Furnace with O.D60*1000mm Quartz Tube

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Application

1.Laboratory heat thermal processing

2.High Vacuum Sintering Heating Annealing Brazing

3.Laboratory Thin Film Preparation,Nano tube growthing

4.Laboratory CVD system,graphene growthing,preparation.

Product parameters
Product Name1200 degree CVD Furnace
Modle No.CHY-T1280A-3Z4C
Heating zonesSingle heating zone
Heating zone length400mm
Constant temperature zone length200mm
Tube Materialhigh purity quartz tube
Tube diameterO.D80*I.D74*1000mm Quartz Tube
Tube Length1000mm,750mm,1000mm,1200mm as enquiry
ThermcoupleK type
Maximum heating temper1150 dgree
Heating rate20c/min,adjustable suggestion 10 degree/min
Heating elementFe-Co-Al by Mo alloy
Sealing Methodstainless steel vacuum flange
Vacuum Air-tightness9.8×10-4Pa
Temperature Accuracy±1℃
Control ModeIntelligent PID programmable Control,30 steps sintering curve restore
Mass Flow Controller3 gas way mass flow controller
Flowmeter Core304 stainless steel
Measure Accuracy+/- 1.0% F.S
Pressure Range-0.1~0.15MPa
A way gas range0~100SCCM
B way gas range0~200SCCM
C way gas range0~500SCCM
Vacuum Pump4C
Power SupplyAC220V  50Hz
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